NiO阳极薄膜制备与电化学性能

Research on the Preparation and Electrochemical Properties of NiO Anode Films

采用真空蒸镀并辅以热氧化法制备了NiO电极薄膜,考察了氧化温度对薄膜结构与电化学性能的影响. 结果表明,在600～700 ℃氧化温度下制备的NiO薄膜由颗粒大小为56～81 nm的纳晶组成. NiO薄膜的可逆放电容量随氧化温度的升高而增大,循环性能却略有降低. 在600 ℃氧化2 h时制得的NiO薄膜具有较高的放电容量和很好的循环性能.

Nickel oxide （NiO） thin films were fabricated by vacuum evaporation of Ni and subsequent thermal oxidation under oxygen atomsphere, the influences of oxidation temperature on the structures and electrochemical properties were explored. The results show that the prepared thin films are of nanocrystalline structure with the average particle size of 56 -81 nm. With the increase of oxidation temperature, the specific capacity of NiO thin film increases but the cycling property deteriorates slightly. At the oxidation temperature of 600 ℃ for 2 h, NiO thin film prepared by vacuum evaporation and subsequent thermal oxidation possesses better rechargeable property and higher discharge capacity, and could be used as anode material in all-solid-state thin film Li-ion battery.