摘要
本文尝试采用非含水的NH4F或KF以及含水的KF电解质溶液对Hg(1-x)CdxTe(x=0.2)表面的阳极氟化进行了研究,着重分析了阳极氟化膜生长的基本过程及其机理,讨论了阳极氟化条件及工艺对薄膜组成及质量的影响。
A novel anodic fluoridization process using nonaqueous NH_4 F or KF and/or aqueous KF electrolute for forming native fluoride films on Hg(1-x)CdxTe(x=0.2)is described. The principal anodic fluoridization process and its mechanism are analyzed with emphasis. The effect of the growth condition on the film composition and quality is discussed.
出处
《功能材料与器件学报》
CAS
CSCD
1996年第1期47-52,共6页
Journal of Functional Materials and Devices