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尿素熔体中Cu-Ti合金电沉积研究

Electrodeposition of Cu-Ti in Urea Melt
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摘要 采用循环伏安曲线、恒电位电解断电后的电位-时间曲线以及EDAX等方法,研究了Cu(Ⅱ)、Ti(Ⅳ)在尿素-金属溴化物熔体中还原的电极过程,探讨了Cu—Ti合金电沉积的条件和机理。结果表明,在尿素-金属溴化物熔体中,Cu(Ⅱ)一步不可逆还原为Cu,Ti(Ⅳ)被还原,并与Cu(Ⅱ)共沉积为Cu—Ti合金,所得Cu—Ti合金中含钛量可达49at%。 Electro-reduction of Cu(Ⅱ), Ti (Ⅳ) in urea-metal bromide melt is studied by means of cyclic voltammetry, current-time curve at potential step, open circuit potential -time curve after constant-potential electrolysis and EDAX. Mechanism and condition of Cu-Ti electrolytic co-deposition are also discussed. Experimental results show that electro-reduction of Cu (Ⅱ) to Cu irreversible in one step. Ti (Ⅳ) is reduced and co-deposited with Cu resulting in a Ti content of 49 at% in Cu-Ti alloy obtained.
机构地区 中山大学化学系
出处 《电镀与涂饰》 CAS CSCD 1996年第2期1-3,4,共4页 Electroplating & Finishing
关键词 共沉积 尿素 熔体 钛铜合金 电镀 镀合金 Cu-Ti alloy, co-deposition, urea melt
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