微波等离子体化学气相沉积金刚石薄膜研究

Diamond Deposition Using Microwave Plasma Assisted Chemical Vapor Deposition

本文系统研究了石英钟罩式微波等离子体辅助化学气相沉积装置对沉积金刚石薄膜的影响。与石英管式微波等离子体沉积装置相比，该装置能使用较高的沉积气压、较大的气体流量和较高的微波功率。本文着重研究了沉积气压、气体流量和甲烷浓度对金刚石薄膜形貌和生长速度的影响。发现生长速度随着沉积气压和甲烷浓度的增大而增大，晶体形态随着甲烷浓度的增大而变差。并使用该装置成功地在４００℃低温沉积了６０ｍｍ的金刚石薄膜。

In this paper diamond films were deposited using bell-jar type microwave plasma assisted CVD system. The effects of pressure, gas flow and methane concentrate in the growth rate and micrography of CVD diamond films were discussed. It was found that diamond growth rate increased with depositon pressure and methane concentration, and diamond crystalline deteriorated when methane concentration was too high. In our research, bell-jar type MPCVD system was certain suitable for low temperature diamond deposition.