摘要
应用低能离子束辅助磁控溅射(IBAMS)沉积铬-铜-氮薄膜,研究了铜含量和轰击能量对薄膜结构、硬度和断裂韧度的影响。结果表明:在相同的轰击能量(400 eV)下,铜含量对薄膜结构和硬度的影响不明显,但是铜的加入有利于提高薄膜的断裂韧度;离子辅助轰击能量从400 eV增加到800 eV时薄膜的结构发生了显著变化,断裂韧度和硬度均大幅度提高。
Cr-Cu-N films were deposited using low energy ion beam assisted magnetron sputtering （IBAMS）. The effects of copper and bombardment energy on structure, hardness and fracture toughness of the films were studied. The added copper had no obvious effects on the film structure and hardness at same bombardment energy of 400 eV. But added copper was beneficial to improvement of the film fracture toughness. When the ion bombardment energy was increased from 400 eV to 800 eV, the film structure was changed remarkably and its fracture toughness and hardness were improved further.
出处
《机械工程材料》
CAS
CSCD
北大核心
2006年第5期30-32,共3页
Materials For Mechanical Engineering
基金
国家自然科学基金资助项目(50371060)
