摘要
研究了在含有硫代硫酸钠(Na2S2O3)的镀液中电镀Ni-S非晶态合金的条件。结果表明,Ni-S合金镀膜的成分随着电流密度、镀液中Na2S2O3的含量、镀液pH值的变化而变化,但镀膜结构则由镀膜中硫含量所决定。根据X射线衍射分析,含硫量为15-30at%的镀层具有非晶态结构。此外还对Ni-S合金镀膜的形成过程及电镀条件与镀膜形成的关系进行了研究。
Beginning from the formation of amorphous alloy film and its use, the Ni-s amorphous alloy film was deposited by a method using an electroplating bath containing Na2S2O3,and the deposition conditions were considered in detail. The integration of Ni-S alloy film changes in plating current density,Na2SO3 concentration and bath pH, but its structural change is determined by the S content in the deposits. X-ray diffraction patterns show that films containing about 15-30at%S form amorphous alloy. In addition, the process of Ni-S alloy film deposition and the relation of plating conditions and preparations were studied.
出处
《材料科学与工艺》
CAS
CSCD
北大核心
1996年第3期107-110,共4页
Materials Science and Technology
关键词
电镀
非晶态
镍基合金
Ni-S alloy
electroplating
amorphous
structure