电镀Ni－S合金的析出过程及非晶态结构的形成

The Deposition Process and Preparation of Amorphous Film on Ni-S Alloy by Electroplating Method

研究了在含有硫代硫酸钠（Ｎａ２Ｓ２Ｏ３）的镀液中电镀Ｎｉ－Ｓ非晶态合金的条件。结果表明，Ｎｉ－Ｓ合金镀膜的成分随着电流密度、镀液中Ｎａ２Ｓ２Ｏ３的含量、镀液ｐＨ值的变化而变化，但镀膜结构则由镀膜中硫含量所决定。根据Ｘ射线衍射分析，含硫量为１５－３０ａｔ％的镀层具有非晶态结构。此外还对Ｎｉ－Ｓ合金镀膜的形成过程及电镀条件与镀膜形成的关系进行了研究。

Beginning from the formation of amorphous alloy film and its use, the Ni-s amorphous alloy film was deposited by a method using an electroplating bath containing Na2S2O3,and the deposition conditions were considered in detail. The integration of Ni-S alloy film changes in plating current density,Na2SO3 concentration and bath pH, but its structural change is determined by the S content in the deposits. X-ray diffraction patterns show that films containing about 15-30at%S form amorphous alloy. In addition, the process of Ni-S alloy film deposition and the relation of plating conditions and preparations were studied.