摘要
建立了一个磁控溅射模型，在几种特殊情况下，给出了计算机模拟的薄膜厚度三维分布和二维分布，提出了制备大面积薄膜的条件．结果表明：计算机模拟的结果与实验结果和有关文献的结果一致．
A magnetron sputtering model is developed by taking the distribution of magnetron magnetic field into consideration.In a few special cases,the relative thickness distribution in three dimensions and two dimensions of the deposited films are given by mathematical integration.The methods of depositing the films of a large area are proposed.It is shown that the results of computer simulation are in agreement with those of experiments and published literature.
出处
《华中理工大学学报》
CSCD
北大核心
1996年第1期89-92,共4页
Journal of Huazhong University of Science and Technology
关键词
磁控溅射
薄膜厚度
磁场
均匀性
s: magnetron sputtering
film thickness
magnetic field
model
