AFM制作纳米光栅技术研究

Technique of nano-grating fabricated by AFM

在扫描探针纳米加工技术的基础上,提出了利用原子力显微镜(AFM)来制作高频光栅的新工艺。利用AFM硅制探针,在接触模式下对光盘(聚碳酸酯材料)进行刻划试验。对刻划光栅的工艺参数进行优化,得到了纳米量级光栅。并将刻划所得光栅应用于数字云纹法,与数字参考栅干涉形成微/纳米数字云纹。实验结果表明,该法所制得的光栅可以应用于实际变形的测量。

On the basis of micro-fabrication technique using the atomic force microscope, a new method was proposed for producing high frequency grating. The grating was fabricated on compact disc（polycarbonate） with silicon AFM tip under the contact mode. The fabrication technique was discussed. The experimental parameters were optimized. A grating of nanostructure was formed. As further application, the formed grating involves with digital grating to form digital moiré. The grating can be used in deformation measurement of objects in nano-deformation.