强电流直流扩展弧金刚石沉积技术的研究

Research on Diamond Deposition by High Current Extended DC Arc Plasma CVD System

采用自行研制的Q-500金刚石涂层沉积设备,同时采用两种不同结构的等离子体炬对经酸碱二步法处理后的硬质合金钻杆(YF06)分别进行了金刚石涂层的沉积,并对沉积后的样品表面进行了分析和研究。初步的研究结果表明:等离子体炬的结构对金刚石涂层的沉积影响很大,改进前的等离子体炬所产生的弧柱不稳,导致沉积温度波动幅度大,而改进后的等离子体炬能产生稳定的弧柱,沉积温度变化不大并且沉积的金刚石涂层具有大面积、均匀性好和高质量的特点。

High current extended DC arc plasma equipment is manufactured to carry out CVD coating deposition on alkali-etching and acid-etching samples of the cemented carbide bar YF06 by the two different plasma torches, and the samples deposited are analyzed by SEM. The results show that the structure of the plasma torch has an important role in the deposition of diamond coating, before improvement of the plasma torch, the arc column produced is very unstable, and deposition temperature is also unstable. But the improved-plasma torch can produce a stable arc column, and the diamond coating has many advantages of large area, good homogeneity and quality.