摘要
利用磁控溅射法制备了NiTiPd形状记忆合金薄膜,并对晶化后的薄膜测量了其相变特性和力学性能。结果表明,薄膜在真空室中于750℃热处理1 h可获得较好的形状记忆效应,NiTiPd薄膜的相变温度比相应的NiTi薄膜的相变温度高,奥氏体相变温度As高于100℃。在室温到150℃范围,随着温度升高,薄膜的断裂强度提高,但是残余应变变小。
NiTiPd shape memory alloy films were prepared by RF magnetron sputtering technique. NiTiPd films were heat-treated in the vacuum chamber at 750℃ for 1 h to get good shape memory effect. The transformation characteristics and mechanical properties of NiTiPd thin films were investigated. It was found that during room temperature to 150℃, with increasing temperature, the fracture stress of NiTiPd films increases and residual strain decreases.
出处
《压电与声光》
CSCD
北大核心
2006年第3期319-320,324,共3页
Piezoelectrics & Acoustooptics
基金
上海市科委基础研究重点基金资助项目
关键词
磁控溅射法
NiTiPd薄膜
相变
力学性能
magnetron sputtering
NiTiPd thin films
phase transformation
mechanical property
