摘要
分析了不同退火温度下ZnO薄膜的XRD及PL谱,结果表明:ZnO结构及光学特性的优劣与薄膜中的缺陷紧密联系,而温度是改变晶体缺陷的重要条件。文章详细分析了温度影响ZnO晶体的结构和发光特性的机理。
XRD and PL of ZnO film at different temperature were analysed, the result shows that the structure and optical propriety is contact closely with the vacancy and defect in the film. and the temperature is important to the change of vacancy and defect in the film we analyze the principle of the structure and optical properties caused by temperature minutely.
出处
《安阳师范学院学报》
2006年第2期18-20,共3页
Journal of Anyang Normal University