摘要
随着微电子工业工序复杂性的增加和产品尺寸的不断缩小,气态分子污染物(AMC)对产品的影响成为洁净室环境控制中重点关注的问题。文章介绍了洁净室中AMC的定义,重点阐述了AMC的监测技术。
In semiconductor facilities, contamination control programs require the use of high efficiency particulate air (HEPA) filter and ultra low penetration air (ULPA) filter to control the particles. However, as device dimensions shrink, airborne molecular contaminants (AMC) that poses a threat to product performance and reliability will become the primary contamination in semiconductor cleanrooms. In this paper, the definiton and classification of AMC are discussed, the fundamental principle of measurement is also presented.
出处
《洁净与空调技术》
2006年第2期12-17,共6页
Contamination Control & Air-Conditioning Technology
关键词
洁净室
气态分子污染物
监测
控制
Cleanroom Airborne Molecular Contaminants Monitoring Control