Ni离子注入多晶ZrO_2的表面电性能和结构

STRUCTURE AND SURFACE ELECTRICAL PROPERTIES OF POLYCRYSTALLINE ZrO_2 IMPLANTED BY Ni ION

对氧化钇(Y_2O_3)部分稳定氧化锆(ZrO_2)样品在室温下进行了Ni离子注入(140kev,5×10^(15)-2×10^(17)ios/cm^2)和热退火处理.应用电学测量,Rutherford背散射技术(RBS),X射线光电子能谱(XPS)和喇曼光谱方法研究了Ni离子注入多晶ZrO_2的表面电性能,注入层结构及其热退火的影响。

In this paper, it is reported that the nickel ions (140 keV, 5×10^(15)-2×10^(17)ions/cm2) were implanted at room temperature into the specimens of yttria which were partially stabilized by zirconi-a. The annealing processes were decided . By making use of electric measurement, Rutherford back scattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy, we have studied the effects of implantation and annealing on the electrical properties of the surface and the structure of implanted layer of polycrystalline ZrO2.