摘要
对在不锈钢基底上用电沉积法制备239Pu(α)参考源作了详细研究。试验中选择NH4Cl-HCl体系,观察了铵盐浓度、电解质酸度、电解质体积、电流密度、电镀时间、不锈钢基底材料和单面电解槽尺寸对239Pu电沉积率的影响,从而确定了最佳工艺条件,并已用于239Pu(α)参考源的批量生产中。该电镀工艺的优点是简便、快速,且获得的镀层均匀、牢固。该工艺也已成功地用于制备241Am(α)源和244Cm(α)源。
The preparation of 239 Pu(α) reference sources on stainless steel backing is performed. In the period of experiment, the ammonium chloride hydrochloric acid system is selected. The affect of 239 Pu electrodeposition on the concentration of ammonium chloride, electrolyte acidity, electrolyte volume, plating time, current density, the size of plating cell, and backing material(different types of stainless steel) are observed. The optimum process of plutonium electrodeposition is recommended and it has been used in the production of 239 Pu (α) reference sources. The advantages of this process are simple, rapid and convenient. Moreover, the deposits are uniform and adherent . This process has also been used in the preparation of 241 Am(α) source and 244 Cm(α) source.
出处
《同位素》
CAS
北大核心
1996年第2期65-69,共5页
Journal of Isotopes
关键词
放射源
钚239
电沉积
环境监测
radioactive source 239 Pu transplutonium electrodeposition environmental monitoring