金属(Ti,Ni)/(0001)Al_2O_3界面电子结构的光电子能谱研究

Study on the Electronic Structure of (Ti,Ni)/(0001)Al_2O_3 Interfaces by XPS

采用离子减薄结合X射线光电子能谱方法原位对金属—陶瓷界面的电子结构进行研究,其结果表明在界面处,对Ti/Al_2O_3体系,有氧化态的Ti,同时发现部分的Al^3+被还原;对Ni/Al_2O_3体系,在经退火处理后,界面处Ni有多种结合态存在.本文结果与理论分析相一致,对其它的实验结果给予了较好的解析.

The electronic structure of Ti, Ni/Al2O3 interfaces were studied by X - ray photoelectron spectra (XPS) in situ during sputtering. The experiment results show that in the interface area,for Ti/Al2O3, was oxidated and A13+ was reduced;for Ni/Al2O3,Ni has several oxidation states including the spinel.