摘要
采用离子减薄结合X射线光电子能谱方法原位对金属—陶瓷界面的电子结构进行研究,其结果表明在界面处,对Ti/Al_2O_3体系,有氧化态的Ti,同时发现部分的Al^3+被还原;对Ni/Al_2O_3体系,在经退火处理后,界面处Ni有多种结合态存在.本文结果与理论分析相一致,对其它的实验结果给予了较好的解析.
The electronic structure of Ti, Ni/Al2O3 interfaces were studied by X - ray photoelectron spectra (XPS) in situ during sputtering. The experiment results show that in the interface area,for Ti/Al2O3, was oxidated and A13+ was reduced;for Ni/Al2O3,Ni has several oxidation states including the spinel.
出处
《化学学报》
SCIE
CAS
CSCD
北大核心
1996年第9期888-892,共5页
Acta Chimica Sinica
基金
国家自然科学基金委员会和国家高技术新材料领域专家委员会联合资助的重大项目