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A cathodic arc enhanced middle-frequency magnetron sputter system for deposition of hard protective coatings 被引量:1

A cathodic arc enhanced middle-frequency magnetron sputter system for deposition of hard protective coatings
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机构地区 Accelerator Laboratory
出处 《Nuclear Science and Techniques》 SCIE CAS CSCD 2006年第3期135-138,共4页 核技术(英文)
基金 SupportedbytheNationalNaturalScienceFoundationofChinaundercontractNos.10275049and10435060.
关键词 阴极弧 中频磁控管溅射 类金刚石碳 内靶 Cathodic arc, Middle frequency magnetron sputtering, Diamond-like carbon.
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同被引文献41

  • 1任大成,范庆军,王茹,王世华.线型碳的合成及应用研究进展[J].化学通报,2004,67(6):470-470. 被引量:5
  • 2刘艳红,张家良,王卫国,李建,刘东平,马腾才.CH_4或CH_4+Ar介质阻挡放电中的离子能量和类金刚石膜制备[J].物理学报,2006,55(3):1458-1463. 被引量:10
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  • 6柳翠.类金刚石碳膜制备工艺及掺杂性能研究[D].大连理工大学博士学位论文,2004.
  • 7张通和,吴瑜光.离子柬表面工程与应用[M].北京:机械工业出版社,2005.
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