退火处理对DKDP晶体光学均匀性的影响研究

Study on Influence of Thermal Annealing on Optical Homogeneity of DKDP Crystal

分别对不同生长速度的DKDP晶体进行了退火处理。结果表明,适当温度的退火处理能有效地提高晶体的光学均匀性,尤其是对快速生长的晶体质量提高更为显著。在实验温度范围内,退火温度越高,质量改善越明显。对退火机理进行了初步讨论。

The influence of thermal annealing on DKDP crystals grown at different rates was studied. The results show that a thermal annealing at the proper temperature of experiments can significantly improve the optical homogeneity of the crystals, especially for the crystal grown at a rapid speed. And the higher the annealing temperature is , the better the optical homogeneity is in the temperature range of the experiments. The mechanism of annealing was discussed briefly.