摘要
分别对不同生长速度的DKDP晶体进行了退火处理。结果表明,适当温度的退火处理能有效地提高晶体的光学均匀性,尤其是对快速生长的晶体质量提高更为显著。在实验温度范围内,退火温度越高,质量改善越明显。对退火机理进行了初步讨论。
The influence of thermal annealing on DKDP crystals grown at different rates was studied. The results show that a thermal annealing at the proper temperature of experiments can significantly improve the optical homogeneity of the crystals, especially for the crystal grown at a rapid speed. And the higher the annealing temperature is , the better the optical homogeneity is in the temperature range of the experiments. The mechanism of annealing was discussed briefly.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2006年第3期532-535,共4页
Journal of Synthetic Crystals
基金
北京市自然科学基金资助项目(No.2032005)
北京市委组织部优秀人才专项培养资助项目
关键词
DKDP晶体
热退火
光学均匀性
DKDP crystal
thermal annealing
optical homogeneity