摘要
基于传统工艺,新研制开发了一套非晶硒合金膜制备的设备和工艺流程。实验采用高真空电阻加热蒸镀方法,已制备出面积为180mm×180mm的非晶硒合金膜并进行了基本特性检测。测试结果表明:所制备的膜非晶化程度高,厚度最大为90μm,厚度分布比较均匀,相对误差在10%以内。所制备的膜满足光电转换膜的基本特性要求。
A new set of facilities and work flow for preparing amorphous selenium alloy films had been developed out based on traditional techniques, High vacuum resistance heating evaporation method is taken, amorphous selenium alloy films with 180 mm×180 mm in area had been worked out and fundamental parameters had been detected. The test results show that the amorphous selenium alloy film prepared by the experiment is high amorphous, thickness maximum of the film is 90 μm and thickness distribution is close to uniform which the relative error of thickness distribution is below 10 percent. The film prepared is satisfied with the basic requirement of photoelectric conversion film.
出处
《电子元件与材料》
CAS
CSCD
北大核心
2006年第7期52-55,共4页
Electronic Components And Materials
关键词
半导体技术
非晶硒
X射线平板探测仪
热蒸镀
semiconductor technology
amorphous selenium
X-ray flat panel detector
thermal evaporation deposition