CuW及CuWCr触头材料的电解抛光

Electro-polishing of CuW,CuWCr Contact Materials

对 CuW、CuWCr触头材料的电解抛光参数进行了研究。以电解抛光原理为依据，以经验数据为参考,通过对以往的电解抛光装置的改进,确定了对 CuW、CuWCr触头材料电解抛光的最佳参数。结果表明，在实验条件下,CuW、CuWCr触头材料的抛光时间分别为 15～25 s和 20～35 s,电压均为 2.5～4.0 V时可以获得优良的金相观察图。

The parameters of electro-polishing of CuW,CuWCr contact materials was studied in this paper. The optimum parameters of the contact materials were finally defined by improving of laboratory apparatus based on the electro-polishing principle and the experience data. The results show that the optimum parameters are as follows： the durations for CuW, CuWCr contact materials are 15-25sec. and 20-35sec. respectively, the voltage is 2.5-4.0 V.