离子注入Y~＋对镍基合金渗铝层1100℃氧化膜生长应力的影响

INFLUENCES OF Y￣+-IMPLANTATION ON GROWTH STRESS OF OXIDE SCALE FORMED ON ALUMINIZED Ni-BASE ALLOY

利用氧化膜应力原位测量装置研究了离子注入１×１０^（１７），１×１０^（１６）Ｙ~＋／ｃｍ~２对Ｎｉ－１５Ｃｒ－６Ａｌ合金渗铅层氧化膜恒温生长应力的影响．结果表明，离子注入上述二种剂量的Ｙ~＋对合金渗铝层在１１００℃的氧化动力学没有显著影响，但降低了氧化膜的恒温生长应力．通过对实验结果进行分析，认为离子注入Ｙ~＋降低Ａｌ_２Ｏ_３膜的生长应力，增强氧化膜的粘附性的原因在于改变了氧化膜的生长机制和促进了膜的塑性变形能力．

The influences of implanted yttrium with doses of 1×10￣(17), 1×10￣(16)Y￣+/cm￣2 on the growth stress of oxide scales formed on aluminized Ni-15Cr-6Al alloy were studied by using apparatus of oxide scale stress measurement. The experimental results indicated that Y￣+-implantation at the two doses had no effects on the oxidation kinetics of the alloy, but decreased the growth stress in the oxide scale formed at 1100℃. The results are discussed. The reason that ion implantation with two doses decreases the growth stress and improves the adhension of alumina scale may be that Y￣+- implantation changes the oxidation mechanism of the scale and facilitates the plastic deformation of the scale.