用于衍射微光学元件制备的无掩模光刻技术

Non-Mask Lithograph Technology for Manufacturing Diffractive Micro-Optical Devices

提出了一种新的基于数字微镜的无掩模光刻技术,将以往的模拟掩模发展为数字掩模,为大规模、快速、灵活制作衍射微光学元件开辟了一条新的道路;重点研究了数字掩模技术的实现原理,并进行了验证。

A new non-mask lithograph technology based on digital micromirror device is brought forward for the first time. It develops conventional analog mask into digital mask, and it inaugurates a road for manufacturing diffractive micro-optical elements on a large scale, fleetly, and flexibly. The realization principle of digital mask technology is studied emphatically, and the experimental validation is carried out.