CMOS光栅图像纳米细分技术研究

Research on the technique of nanometer subdivision based on the CMOS grating image

光栅技术已在长度测量、角度测量、位置测量、自动检测、自动控制等诸多领域广泛应用。采用长光栅作为检测元件,但对光栅的细分不用常用的电子学细分,而是采用CMOS显微成像系统读取长光栅,并随之对光栅图形进行细分。系统由光源、光阑和聚光镜、标尺光栅、显微物镜及CMOS电子目镜组成,光栅图像进入PC机,采用软件进行细分。试验获得的光栅图形清晰,从而为利用数字图像处理技术进行细分提供可靠依据,实验研究的细分分辨力为80nm。

Metrological grating technique has been widely used on length and dividing measuring systems, position and auto-control systems, and so on. In this paper, produced a new detect system based on metrological grating. On usual system, we do subdivide based on electronics, but in our system, use complementary metal-oxide semiconductor （CMOS） image sensor and microscope system. Firstly, use CMOS and microscope system gain the image of grating. Secondly, subdivide the grating image. Whole system included lamp-house, diaphragm and condenser lens, metrological grating, microscope objective and CMOS image sensor. The grating image transfer to PC by USB, and subdivide it by software. In experiment, the grating image is clear, so we can use digital image processing technique subdivide the grating image. The result of the experiments is, measuring resolution is 80nm.