基于无机纳米粒子模板刻蚀的纳米阵列

Nanostructures Etched by Inorganic Nanoparticle Masks

阐述了利用不同的方法，如自组装、嵌段共聚物辅助等方法在基底表面形成一层均匀的无机材料纳米粒子掩模，以此作为模板进行刻蚀，可得到各种纳米图形和纳米结构。这一方法具有操作简单、成本低、可批量生产等优点，在纳米电子器件等领域具有广泛的应用前景。

It is reviewed that inorganic nano-materials templates is a new rote toward nano-patterning fabrication. Nanopattern and nano-strncture are formed with inorganic nano-materials masks, which are created by various methods, such as self-assembly, LB approach, via block copolymers self-assembly templates. This method mentioned in the paper is of low cost, high throughput and simple procedures. The nano-patterns created in this way make much prospect of nanometer scale device.