摘要
介绍了一种新型的用CMOS标准工艺制作的具有抑制侧壁注入效应的横向磁敏晶体管.理论分析及实验测量结果表明。
In this paper we present an over magnetotransistor made with standard CMOS technology.The device is a dual-collector lateral magnetotransistor with suppressed injection of the emitter sidewalls.A wide linear response to the magnetic field and very high sensitivi-ties are experimentally and theoretically demonstrated.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
1996年第7期24-27,共4页
Journal of Shanghai Jiaotong University
基金
复旦大学国家微分析中心资助项目
关键词
抑制侧壁注入
磁敏晶体管
CMOS工艺
suppressed sidewalk injection
magnetotransistor
CMOS technology