ICP-CVD制备高质量疏水性碳氟聚合物薄膜的研究

Study of High Quality Hydrophobic Fluorocarbon Polymer Films Grown by Inductive Coupled Plasma Chemical Vapor Deposition

在室温下以c-C4F8为反应气体,采用电感耦合等离子体化学气相淀积(ICP-CVD)法制备出碳氟聚合物薄膜,研究了工艺条件与薄膜的光、电性能和结构与疏水性的相关性。结果表明,薄膜结构均匀致密,主要由C-CFX、CF、CF2和CF3组成;当射频功率为400 W,c-C4F8的流量为40 sccm时,制备出的薄膜和去离子水之间的接触角高达112°。

High quality fluorocarbon polymer films were grown by inductive coupled plasma chemical vapor deposition （ICP-CVD） with c-C4F8 as the reactive gas. Microstructures and properties of the films were characterized with atomic force microscopy （AFM）,Auger electron spectroscopy （AES）,X-ray photoelectron spectroscopy （XPS） and Fourier transform infra-red spectroscopy （FFIR）. The results show that the fairly compact and uniform films are composed of C-CFx, CF, CF2 and CF3. When the film was deposited under the conditions of a RF power of 400 W and a c-C4F8 flow rate of 40 sccm,the contact angle of de-ionized water droplet on the film was found to be as large as 112°.