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新型表面波等离子体源的诊断及不同工艺条件下的等离子体特性 被引量:3

Diagnosis and Properties of Newly Developed Surface-Wave-Sustained Plasma
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摘要 表面波等离子体(Surface-wave-sustained plasma,SWP)是近年发展起来的一种新型低压、高密度等离子体。应用这种技术,很容易实现镀膜过程中的离子束辅助沉积(IBAD),从而制备出性能优异的类金刚石薄膜(DLC)。本文介绍了一种新型的SWP源,说明了朗缪尔探针等离子体诊断的基本原理,研究了微波功率、靶电压、真空度等对等离子体特性的影响。测试了不同工艺条件下的等离子体密度,电子温度,等离子体电位,悬浮电位。研究结果表明,微波功率、靶电压和真空度等参数对等离子体特性具有重要的影响。结果同时表明,这种表面波等离子体源即使在0.85 Pa的真空度下也能够产生高达1.87×1011cm-3的电子密度(在2.8 Pa可达2.1×1012cm-3)。 A novel technique has been developed, using a single Langmuir probe, to diagnose the plasma generated with a newly-developed surface-wave-sustained plasma (SWP) source working under different conditions. Physical properties of the SWP, such as its density, its electron temperature, its potential and its floating potential, were studied. Influence of various factors, including microwave power, target voltage and gas pressure,on the plasma properties in diamond-like carbon (DLC) film growth was also discussed.The results show that the newly-developed SWP source is capable of generating plasma with an electron density up to 1.87 × 10^11 cm^-3 even at a low pressure of 0.85 Pa(at a pressure of 2.8 Pa,its electron density reaches 2.1 × 10^12 cm^-3).
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2006年第3期214-218,共5页 Chinese Journal of Vacuum Science and Technology
关键词 表面波等离子体 工艺参数 电子密度 类金刚石薄膜 Surface-wave-sustained plasma, Experiment parameter, Electron density, DLC
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参考文献14

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