线形微波等离子体CVD金刚石薄膜沉积技术

Development of Linear Extended Microwave Plasma Chemical Vapor Deposition for Diamond Film Growth

本文将讨论一种新型的微波等离子体CVD设备———线形微波等离子体CVD设备和其在金刚石薄膜制备技术中的应用。利用Langmuir探针方法对线形微波等离子体CVD设备产生的H2等离子体进行的等离子体参数测量表明,在工频半波激励的条件下,H2等离子体的电子温度和等离子体密度分别约为6 eV和1×1010/cm3。尝试利用线形微波等离子体CVD设备,在直径为0.5 mm的小尺寸硬质合金微型钻头上进行了金刚石涂层的沉积,获得了质量良好的金刚石涂层。由于线形微波等离子体CVD设备产生的等离子体面积具有容易扩大的优点,因而在需要使用较大面积等离子体的场合,它将有着很好的应用前景。

A novel technique, called Linear Extended Microwave Plasma Chemical Vapor Deposition （CVD）, was developed to grow diamond films. Langnuir probe was used to diagnose the H2 plasma generated by our home-made apparatus dedicated to this new technique. High quality diamond fdms were also grown on a cemented carbide micro-drill,0.5 mm in diameter,to exemplify the technique. Since the plasma so generated can cover large areas, its industrial applications were also discussed.