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脉冲直流PCVD制备新型Ti-Si-C-N纳米复合超硬薄膜 被引量:5

New Super Hard Ti-Si-C-N Nanocomposite Coatings Deposited by Pulsed DC Plasma CVD
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摘要 用工业型脉冲直流等离子体化学气相沉积(PCVD)设备,在高速钢(W18Cr4V)基材表面沉积新型四元Ti-Si-C-N复合超硬薄膜。结果表明:Ti-Si-C-N薄膜是由面心立方结构的TiN和TiC纳米晶、Ti(C,N)固溶体及存在于晶界的非晶Si3N4和a-C组成,形成TiN/TiC/Ti(C,N)/a-C/a-Si3N4复相结构,这种复相结构存在着[111],[220]和[200]混合择优取向。SiCl4和CH4流量变化是影响薄膜相组成和硬度变化的主要工艺参数。随Si含量的增加,薄膜的显微硬度先升后降,表面形貌由致密的细颗粒状变为粗大的枝条状;C元素的加入能抑制柱状晶的形成,对硬度影响较小。 Using a pulsed dc plasma chemical vapor deposition technology, a new class of quaternary Ti-Si-C-N coatings were deposited on HSS substrate at 550℃. The chemical composition and the hardness of coatings could be well controlled through the adjustment of CH4 and SiCl4 flow rate. Results indicate that the Ti-Si-C-N coatings have a nanocomposite structure of TiN/TiC/Ti(C,N)/a-C/a-Si3N4 with a mixed orientations of [111], [220] and [200]. On the other hand, the change of C content has a little effect on the hardness of coatings. However, the surface morphologies of Ti-Si-C-N coatings changed from granular to strip-shaped with the increase of Si and C content, and the hardness of coatings reaches a maximum value of about 52 GPa at content of 9 at% Si and 24 at% C.
出处 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2006年第5期824-827,共4页 Rare Metal Materials and Engineering
基金 国家自然科学基金项目(50271053 50371067) 973计划项目(2004CB619302) 国家自然科学基金委重大国际合作项目(50420130033)资助
关键词 PCVD Ti-Si-C-N 纳米复合超硬薄膜 微观结构 显微硬度 PCVD super hard nanocomposite coatings microstructure hardness
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参考文献13

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