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极坐标激光直写技术制作微结构 被引量：1

Micro-structure Fabrication with Circular Laser Writing Technology
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摘要 简述了极坐标激光直写技术原理,并利用该技术研究了在铬板、光刻胶版表面制作微结构的工艺,制作了光栅、非涅耳透镜、曲面衍射透镜、平面连续微结构衍射透镜掩模以及基于MEMS技术的微型太阳敏感器光学掩模。 Theory of the circular laser writing technology was described, and the technology for fabrication of microstructure on the chrome and photoresist mask was studied. Grating, spherical surface diffractive lens and mask of plane diffractive lens with continuous relief structure were fabricated using the technology. The optical mask of the micro sun sensor based on the MEMS technology was also fabricated.
作者 王多书 罗崇泰 陈焘 刘宏开 马勉军 黄良甫
机构地区 兰州物理研究所
出处 《激光与红外》 CAS CSCD 北大核心 2006年第7期525-528,共4页 Laser & Infrared
关键词 激光直写技术 掩模 微结构 微光学 laser writing technology mask micro-structure micro optics
分类号 TN249 [电子电信—物理电子学] TN305.7 [电子电信—物理电子学]
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参考文献9

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同被引文献15

  • 1Josip Vukusic, Jrgen Bengtsson, Marco Ghisoni et al.. Fabrication and characterization of diffractive optical elements in InP for monolithic integration with surface-emitting components [J]. Appl. Opt., 2000, 39(3): 398-401.
  • 2Yutaka Kuroiwa, Nobuhito Takeshima, Yoshihiro Narita et al.. Arbitrary micropatterning method in femtosecond laser microprocessing using diffractive optical elements [J]. Opt. Express, 2004, 12(9) : 1908-1915.
  • 3Mikael Karlsson, F. Nikolajeff. Fabrication and evaluation of a diamond diffractive fan-out element for high power lasers[J]. Opt. Express, 2003, 11(3): 191--198.
  • 4X. G. Deng, Y. P. Li, D. Y. Fanet al.. Pure-phase plates for super Gaussian focal-plane irradiance profile generations of extremely high order[J]. Opt. Lett., 1996, 21(24) : 1963-1965.
  • 5C. Sun, C. Liu. Ultrasmall focusing spot with a long depth of focus based on polarization and phase modulation[J]. Opt. Lett. , 2003, 28(2): 99-101.
  • 6Fu Yongqi, Ngoi Kok Ann Bryan, Ong Shing. Diffractive optical elements with continuous relief fabricated by focused ion beam for monomode fiber coupling [ J ]. Opt. Express, 2000, 7 ( 3 ) : 141-148.
  • 7J. R. Fienup. Iterative method applied to image reconstruction and to computer generated holograms[J-. Opt. Eng., 1980, 19(3) : 297--305.
  • 8刘强,张晓波,邬融,田杨超,李永平.离子束刻蚀工艺误差对DOE器件的影响[J].光电工程,2007,34(11):50-54. 被引量：4
  • 9孟祥峰,李立峰.提高离子束刻蚀亚微米光栅侧壁陡直度的方法[J].光学学报,2008,28(1):189-193. 被引量：9
  • 10国承山,李传涛,洪正平,刘婷婷.光衍射数值模拟中不同抽样方法的适用性分析[J].光学学报,2008,28(3):442-446. 被引量：21

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激光与红外
2006年 第7期

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