用直流等离子化学气相沉积法在硬质合金上沉积氮化钛膜的研究

STUDY OF TiN COATINGS ON CARBIDE ALLOY BY DC-PCVD

用直流等离子化学气相沉积法在硬质合金上沉积ＴｉＮ膜，研究了沉积工艺参数对膜层结构、膜层成分、断口形貌和膜层硬度的影响．结果表明，在５００～７００℃温度范围内，可以沉积出单相的ＴｉＮ膜，膜层结构致密，硬度可达Ｈｖ２１５６０Ｎ／ｍｍ２．在５００片刀片装炉量的情况下，沉积室中不同部位的刀片均可得到相同结构和优异性能的膜层，因此采用此沉积法可以实现批量化生产．

Titanium nitride (TiN) coatings have been prepared on cemented carbides in DC-PCVD equipment made by ourselves. The micro-structure, composition, crosssection and hardness of the TiN coatings, as well as the influence of process parameters on them,have been studied. It is found that at the temperature from 500℃ to 700℃, the deposited TiN coating is single phase compact TiN with a hardness of Hv 21 560N/mm2 ;under a batch of 500 bit tools, the properties of TiN coatings deposited on different bits are uniform. It makes the PCVD technique possible for batch production.