摘要
概述了193nm浸液式光刻技术发展现状及技术路线,结合国际半导体技术发展指南(ITRS)和各公司在SPIE微光刻研讨会上宣布的最新研究成果,探讨了193nm浸液式光刻技术的发展趋势。
The current status and roadmap of 193nm immersion lithography is reviewed in this paper, The trends of 193nm immersion lithography has been approached with the roadmap of ITRS and the newest results of research announced in SPIE 2006 Optical Microlithography symposium.
出处
《电子工业专用设备》
2006年第7期1-6,共6页
Equipment for Electronic Products Manufacturing
关键词
浸液式光刻
曝光设备
折射率
偏振技术
双重曝光
Immersion lithography, Exposure Tool, Refractive Index, Polarization Technology, Dual Exposure
