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CdSe薄膜的制备及其图形化 被引量:4

Chemical Bath Deposition of CdSe Thin Films and Its Patterning
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摘要 用化学浴沉积的方法,以CdCl2·2.5H2O为镉源,Na2SeSO3为硒源,柠檬酸钠为络合剂,60℃下反应制备CdSe薄膜,并用XRD、FESEM、UV-Vis等方法进行了表征,研究表明生成的薄膜由粒径分布均匀的粒子组成。进一步以PDMS为印章,以OTS-甲苯溶液为“墨水”,用微接触印刷的方法制备了CdSe薄膜的图形。 Chemical bath deposition is involved to synthesize CdSe films, with CdCl2· 2. 5H2O and Naz SeSO3 as precursors, and trisodium citrate as complexing agent. The films are characterized by XRD, FESEM, UV-Vis. Results indicated that the films are composed with uniform CdSe particles. The pattern of CdSe films is achieved by the microcontact printing method using PDMS as stamp and OTS/toluene as "ink". The pattern is clear and compact.
出处 《材料导报》 EI CAS CSCD 北大核心 2006年第7期119-122,共4页 Materials Reports
基金 国家自然科学基金资助项目(50103006) 上海曙光计划资助项目(01-SG-15) 上海市纳米专项基金(0212nm106)
关键词 CdSe化学浴沉积法 图形化 微接触印刷 CdSe, chemical bath deposition, patterning, microcontact printing
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参考文献24

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同被引文献30

  • 1敖建平,何青,孙国忠,刘芳芳,黄磊,李薇,李凤岩,孙云,薛玉明.化学水浴沉积CdS薄膜晶相结构及性质[J].Journal of Semiconductors,2005,26(7):1347-1352. 被引量:18
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