摘要
介绍了Ｘ光激光薄膜锗靶的制备工艺，在厚度为９０ｎｍ的ｆｏｒｍｖａｒ膜上，采用磁控溅射技术沉积３０～６０ｎｍ厚的锗膜．对锗膜的应力进行了初步的测试与分析，制得的薄膜经干涉仪测量符合要求。
The fabrication of X-ray laser germanium film targets is presented in this paper. The 30￣60urn thickness germanium film was coated on the 90nm thickness formvar film by using radio-frequency magnetron sputtering technology.The germanium film targets accord with the demands of experiments by Leitz interference microscope measurement.
出处
《强激光与粒子束》
EI
CAS
CSCD
1996年第1期78-82,共5页
High Power Laser and Particle Beams
关键词
射频磁控溅射
锗膜
应力
薄膜
magnetron sputtering, germanium film, formvar film, intefferometry,stress
