摘要
提出一种新颖的、蚀刻位相深度超过2π的深蚀刻二元光学技术,并从理论上分析深蚀刻二元光学元件与衍射效率的关系,然后用计算机进行模拟与分析。
A novel deep etch binary optics element with phase depth exceeded 2π is developed. The relationship between deep etch binary element and diffrative efficiency is analysed theoretically and simulated by computer. The preliminary results about characteristics of the deep etch binary optics element are obtained.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1996年第12期1796-1801,共6页
Acta Optica Sinica
基金
国家自然科学基金
中国科学院光电技术研究所微细加工光学技术国家重点实验室资助
关键词
深刻蚀
衍射光学
二元光学元件
deep etch, diffrative optics, binary optics, element.