Co_xNi_(1-x)磁性膜标度行为的研究

Experimental Study the Scaling Behavior of the Co_xNi_(1-x) Films

采用磁控溅射法制备了多晶的Co、Co50N i50、N i薄膜,测量了退火前后这些薄膜的磁滞回线,研究了磁滞回线的面积随外加交流磁场的振幅、频率的变化关系.实验结果表明,退火前后Co、Co50N i50和N i磁性薄膜的磁化动力学行为都满足标度关系A=A0+Hα0Ωβ,退火后磁性薄膜的α值增加,β值减少,这主要是退火后磁性膜的磁各向异性减少.

Polycrystalline Co, CosoNiso, Ni films were deposited on Si substrate by magnetron sputtering. The magnetization hysteresis loops of the prepared and annealed Co,Co50Ni50, Ni films have been measured. The hysteresis loop areas as functions of the frequency Ω and amplitude Hoof applied magnetic field H（t） were studied. The experimental results indicate that, the average hysteresis loop areas A for all prepared and annealed samples appear to display the power-law dependency on the frequency ω and amplitude H0 of H（t） ,A = A0 ＋ H0^αΩ^β, where a and β are the scaling exponents. The annealing lets the value of a increase and the magnitude of β decrease, which is attributed to the decrease of the anisotropy under the annealing. The simulated scaling constants a and β as a function of the anisotropy with Monte Carlo method explain the experimental facts well.