期刊文献+

约束刻蚀剂层技术对金属铝的微结构加工研究 被引量:6

Investigation of Microstructure-machining on Aluminium Surface by Confined Etchant Layer Technique
下载PDF
导出
摘要 采用约束刻蚀剂层技术,以亚硝酸钠为先驱物,通过电化学氧化产生刻蚀剂(硝酸)刻蚀铝,并以NaOH为捕捉剂,在电极模板上形成约束刻蚀剂层.在金属铝表面加工出梯型槽微结构,加工分辨率约为500 nm.通过测量表面氢离子浓度,对捕捉剂的约束效果进行了分析. This work aims to develop confined etchant layer technique (CELT) to fabricate three-dimensional (3D) microstructures of aluminum substrate for microelectromechanical systems (MEMS). In spite of the fact that LIGA technique is current method for metal bulk micromachining with a high aspect ratio, it is extremely difficult to be applied to aluminum because the electrodeposition as one of the process for LIGA is not suitable for using molten salt at a high temperature. The important feature of CELT is to use a scavenger in solution to efficiently consume the etchant so as to confine the etchant as an ultrathin layer on the working electrode surface ( mold electrode). The outer boundary of the diffusion layer of the etchant can retain the three-dimensional fine micro-pattern of the mold electrode. The key issue to successful fabrication of microstrnctures with CELT is the design of an appropriate "generating-scavenging" system for etchant. In the present study, NaNO2 was electrochemically oxidized into HNO3 so as to etch the aluminum workpiece. The thickness of H^+ diffusion layer was confined by reacting with NaOH as the scavenger. The etched pattern of aluminum was observed to be approximately the negative copy of the mold with the precision of 504 nm. The chemical and electrochemical processes were analyzed. The influences of processing parameters, such as current density and scavenger concentration, were discussed. Our preliminary result demonstrates that CELT has a potential to be developed as an effective technique for micromachining for fabrication of micro electromechanical systems. 3D microstructures of aluminum, which can be applied
出处 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2006年第8期1540-1544,共5页 Chemical Journal of Chinese Universities
基金 国家'八六三'计划项目(批准号:2002AA40170) 南昌航空工业学院材料研究中心项目(批准号:ZX200301013) 航空基金项目(批准号:04H56011)资助
关键词 约束刻蚀剂层技术 微机电系统 微加工 电化学 Confined etchant layer technique Micro electromechanical system Aluminium Micromachining Electrochemistry
  • 相关文献

参考文献17

  • 1Palchetti I. , Matrazza G., Mascini M.. Anal. Lett. [J], 2001,34:813-824
  • 2Furnkawa S. , Roy S. , Miyajima H. et al.. Proceedings of the Sixth International Symposium on Micro-machine and Human Science[ C],IEEE, 1995:61-162
  • 3Arias F. , Oliver S. R. J. , Xu B. et al. J. Microelectromechan. Sys. [J], 2001,10( 1 ) : 107-112
  • 4Suh H. J. , Bharathi P. , Beeble D. J. et al.. J. Microelectromechan. Sys. [J], 2000, 9(2) : 198-205
  • 5Takeuchi S. , Shimoyama I.. J. Microelectromechan. Sys. [J] , 2000, 9( 1 ) : 24-31
  • 6Becker E. W. , Ehrfeld W. , Hagman P. et al.. Microeleetronic Eng. [J] , 1986, 4(1) : 35-56
  • 7Romankiw L. T.. Electrochim. Acta[ J], 1997, 42(20-22) : 2985-3005
  • 8顾金楼,施剑林,熊良明.无电沉积高密度钯金属纳米线阵列[J].高等学校化学学报,2004,25(11):1986-1989. 被引量:4
  • 9潘善林,张浩力,彭勇,王臻,力虎林.模板合成法制备金纳米线的研究[J].高等学校化学学报,1999,20(10):1622-1624. 被引量:39
  • 10Shearwood C. , Williams C. B. , Meller P. H. et al.. Electronics Lett. [J], 1995, 31 (21) : 1845-1146

二级参考文献19

  • 1[1]Favier F., Walter E. C., Zach M. P. et al.. Science[J], 2001, 293: 2227-2231
  • 2[3]ZHANG H., Dohnalkova A. C., WANG C. et al.. Nano. Lett.[J], 2002, 2(2): 105-108
  • 3[8]Zhao D., Yang P., Melosh N. et al.. Adv. Mater.[J], 1998, 10(16): 1380-1385
  • 4[9]Shi J. L., Hua Z. L., Zhang L. X.. J. Mater. Chem.[J], 2004, 14(5): 795-806
  • 5[10]Wang D., Zhou W. L., Mccaughy B. F. et al.. Adv. Mater.[J], 2003, 15(2): 130-133
  • 6[11]Hrapovic S., Liu Y., Enright G. et al.. Langmuir[J], 2003, 19(9): 3958-3965
  • 7[12]Zhang Z., Pan Z., Mahurin S. M. et al.. Chem. Commun.[J], 2003, (20): 2584-2585
  • 8[13]Bronstein L., Krmer E., Berton B. et al.. Chem. Mater.[J], 1999, 11(6): 1402-1405
  • 9[14]Diaz R., Arbiol J., Cirera A. et al.. Chem. Mater.[J], 2001, 13(11): 4362-4366
  • 10[15]Minoofar P., Hernandes R., Chia S. et al.. J. Am. Chem. Soc.[J], 2002, 124(48): 14388-14396

共引文献40

同被引文献82

引证文献6

二级引证文献42

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部