摘要
本文对镀膜玻璃的膜层均匀性问题作了初步的探讨。侧重于从溅射原子的沉积过程来分析边缘效应对膜层横向均匀性的影响。
he paper discuses elementally the problem of the film uniformity for coated-glass.The influence that the marginal effect acts on the horizontal uniformity of the film is analysed through the depositing procedure of sputtering atom.
出处
《真空》
CAS
北大核心
1996年第2期20-24,共5页
Vacuum