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慢正电子束研究电子束固化涂层的微观结构

A STUDY OF MICROSTRUCTURE OF EBC COATING BY SLOW POSITRON BEAM
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摘要 用慢正电子束多普勒展宽谱研究环氧丙烯酸酯(EA)体系电子束固化(EBC)涂层。S-E曲线给出了稀释剂分子结构及其相对含量、辐射剂量、预聚物和交联剂含量等对EBC涂层微观结构的影响,以及随深度变化的信息。 The electron beam curred(EBC) coating composed of epoxyacrylates resin as oligomer have been used in vast area. The microstructure of the coating is closely correlated with moleculers structure the components and radiation dose during curing. The S-parameter of positron annhilation doppler broadening was measurred as a function of positron energy to study electron irradiation induced polymerization and crosslinking. The correlations of S-parameter with content, moleculers structure of reactive diluent, and irradiation dose were observed.
出处 《辐射研究与辐射工艺学报》 CAS CSCD 北大核心 1996年第4期201-205,共5页 Journal of Radiation Research and Radiation Processing
基金 上海市自然科学基金
关键词 电子束固化 涂层 慢正电子束 环氧丙烯酸酯 Irradiation curring coating, Slow positron beam, Doppler broadening, Epoxy acrylate
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  • 1Lee Jonglam,Appl Phys Lett,1991年,58卷,1167期
  • 2翁惠民,Nucl Instrum Methods Phys Res A,1991年,307卷,577期
  • 3李振环,元素数据手册,1985年

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