摘要
多光谱成像光谱技术正在向光谱通道更多、集成度更高、体积小和重量更轻的方向发展,而用于分光的多通道滤光片是其关键光学元件,需要相应发展新型多光谱窄带集成滤光片制备技术.提出了组合刻蚀法布里-珀罗(F-P)滤光片间隔层的方法,将光学薄膜制备技术,离子束刻蚀技术与掩膜法技术相结合,形成新的多通道集成滤光片的制备方法.并在单个微型基片上,成功制备了集成16通道窄带线阵滤光片,获得的单元滤光片几何线宽为0.7mm,相对半峰全宽优于1.0%,透射峰定位精度优于0.25%.这一方法不但可满足集成度更高的滤光器件的要求,而且拓展了薄膜制备的方法.
Multi-spectrum imaging system is tending to become smaller, more integrated, lighter and more spectrum channels, and spectrum-dividing multi-channel filter is one of critical elements of the system. A new effective technology is needed to meet the requirement. A new method named combined etching technology was presented here by adjusting the thickness of space layer of F-P filter. Traditional coating technology was combined with ion etching and masking technique to fabricate multi-channel integrated filters. A 16-channel micro integrated narrow band pass filter was fabricated within a small size substrate, whose feature size of unit filter width is 0. 7mm, relative half width of peak transmission is less than 1.0%, and peak position location accuracy is beneath 0. 25%. This method not only meets the requirement of integrating more filters, but also develops the fabrication technology of thin film.
出处
《红外与毫米波学报》
SCIE
EI
CAS
CSCD
北大核心
2006年第4期287-290,共4页
Journal of Infrared and Millimeter Waves
基金
上海市重大科研攻关(03dz11007)资助项目