摘要
利用200kV 离子注入机产生的 Fe^+、Cu^+和 Zn^+3种重离子分别对黄豆种子进行直流注入,以扫描电镜X射线能谱分析法测定低能重离子的注入深度。测量定结果表明,Fe^+的最大注入深度未超过18μm,Cu^+、Zn^+的最大注入深度可达25μm。
The soybean seeds were implanted with Fe^+,Cu^+ and Zn^+ low energy ions which were pro- duced by 200kV implantation ion installation at Institute of Modern Physics,Lanzhou.The im- plantation depth of ions was determined by means of a scanning energy dispersive analysis of X- ray(SEM-EDAX).The analysis results showed that the depth of Fe^+ ions implantation was not more than 18 μm,the deepest depth of Cu^+ and Zn^+ ions implantation reached was 25μm.
出处
《核农学报》
CAS
CSCD
1996年第4期239-243,共5页
Journal of Nuclear Agricultural Sciences
基金
国家自然科学基金