摘要
通过直流溅射沉积法在玻璃衬底上制备了不同生长条件下的纳米金薄膜,利用X射线衍射(XRD)和原子力显微镜(AFM)对其进行表面形貌分析。XRD图显示Au膜具有(111)面择优取向;AFM图显示,在不同的生长阶段Au膜具有不同的表面微结构。总结了不同的工艺条件对薄膜晶粒生长的影响,这项研究对实现金属薄膜的可控性生长有重要意义。
A series of Au nanometer films were deposited on glass substrates in different condition by magnetron sputtering. The surface morphology of the Au films was observed using the atomic force microscopy （AFM） and the texture was detected by X-ray diffraction （XRD）. The favored orientation （111） of the films was certified by XRD patterns. According to the AFM micrographs, microstructure of Au film is different in different courses of film grain growth. To generalize the effect of different preparing conditions on the growth of thin films by date processing, is of great signification to realize the controllable growth of metal films.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2006年第8期1216-1219,共4页
Journal of Functional Materials
基金
国家自然科学基金资助项目(50472008)
安徽省人才开发基金资助项目(2003Z021)
安徽省高新技术基金资助项目(04022001)
关键词
晶粒生长
纳米金
表面形貌
磁控溅射
crystal growth
An film
surface morphology
magnetron sputtering
