摘要
采用溶胶-凝胶法在Pt/Ti/SiO2(1mm)/Si基板上制备了Li和Ti共掺NiO基新型无铅介电薄膜材料,研究了薄膜的形貌、结构、介电性能。结果表明。热分解温度(300~500℃)对薄膜结构影响不明显,经600-800℃退火后的薄膜由NiO与Li-Ni—O复合氧化饧组成;经300℃热分解处理、650℃退火后的薄膜,其表面均匀致密,膜厚约300nm,室温下100Hz时的介电常数为767,当频率高于3000Hz后,介电常数随频率的增加趋于减小。
Li-Ti-Ni-O dielectric thin films were successfully fabricated by sol-gel method on the SiO2 (1μm)/Si and Pt (350nm)/Ti (70nm)/SiO2 (1μm)/Si substrate. The morphology, microstructure as well as dielectric properties of Li-Ti-Ni-O thin films were investigated by optimizing the process condition including pyrolysis and annealing parameters. Li-Ti-Ni-O thin films consist of NiO and Li-Ni-O composite oxide when they were pyroly- sis treated at 300-500℃ and annealed at 600-700℃. The film was about 300nm in thickness without cracks. The dielectric constant of Li-Ti-Ni-O thin film was about 767 at 100Hz and began to decrease with increasing frequency at more than 3000Hz.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2006年第8期1226-1228,共3页
Journal of Functional Materials
基金
国家高技术研究发展计划(863计划)基金资助项目(2003AA302120)
新世纪优秀人才支持计划资助项目(NCET-04-0105)