金属钽丝表面的X射线光电子能谱分析

Analysis of Surface of Tantalum by XPS

用X射线光电子能谱(XPS)对金属钽丝表面进行了分析和研究。通过XPS全程宽扫描和窄扫描,分析了钽丝表面的元素成分和钽的化学态。分析结果表明,钽丝表面的元素成分为Ta,C,O,F,S,Cl,P,Fe,Si,Ni,Cr,Ti,Nb,W,Al。对溅射5 min前后的Ta 4f峰进行曲线拟合,分别得到2个Ta峰和4个Ta峰,对拟合后各个Ta峰的相对位置进行分析,可以得出以上各个Ta峰的化学态;钽丝表面钽的化学态分别为,溅射前Ta2O5和Ta5Si3,溅射后Ta,Ta2O5,Ta5Si3。

The tantalum wire surface was analyzed by X-ray photoelectron spectroscopy （XPS）. Atomic concentrations and chemical states of tantalum were investigated by XPS scanning. The analytical results show that the elements of tantalum wire surface are： Ta, C, O, F, S, Cl, P, Fe, Si, Ni, Cr, Ti, Nb, W, Al. The analytical results suggest that there are two tantalum peaks and four tantalum peaks observed in the computer fitting curves of two Ta 4f XPS spectra, in which one without sputtering and the latter with argon for 5 min. Analyzing the relative positions of every fitted tantalum peaks the chemical states of every tantalum peaks are identified. There are Ta2O5 and TasSi3 exist on the surface of tantalum without sputtering, and there are Ta, Ta2O5 and TasSi3 exist on the surface of tantalum after 5 min sputtering.