氧等离子体处理对ITO薄膜表面性能的影响

Influence of Oxygen Plasma Treatment on Surface Performance of Indium Tin Oxide Film

利用原子力显微镜研究氧等离子体处理对ITO薄膜的微观表面形貌及表面润湿性能的影响。实验结果表明:经过氧等离子体处理,ITO薄膜的平均粗糙度和峰-谷粗糙度减小,薄膜的平整度提高;而且表面吸附力增大近一倍,表面能增大,接触角减小,使ITO薄膜表面的润湿性能和吸附性能得到改善。

Atomic force microscopy was used to study the surface morphology and adhesion capability of indium-tin-oxide （ITO） film with or without oxygen plasma treatment. It is found that the average roughness and peak-to-valley roughness of ITO film decrease after oxygen plasma treatment. Moreover, the surface adhesion force of treated ITO film is almost as twice as that of untreated ITO film, which implies oxygen plasma treatment induces higher surface energy and smaller contact angle, and therefore, the wettability and adhesion performance are improved.