脉冲激光沉积(PLD)铜薄膜过程的模拟研究

Simulation of the Process of Pulsed Laser Deposition of Thin Copper Film

通过对PLD技术中的等离子体的产生及传播理论的分析,对等离子体的传播规律及基片平面上粒子浓度、速度的分布进行了模拟研究;讨论了PLD技术中等离子体的输运机理,为PLD薄膜制备提供了理论参考。

By mathematics and theoretic mode, the process of pulsed laser deposition of thin copper film is studied. The evolvement of plasma generated by the pulsed laser is simulated and based on this the distributions of consistence and velocity are discussed. Moreover, the physics mechanism in the process of pulsed laser deposition is explained. The results obtained are compared with the experiments and other articles.