高磁损耗型FeCoB-SiO_2纳米颗粒膜的微结构与微波电磁特性

Microstructure and Microwave Characteristics of High Loss FeCoB-SiO_2 Nano-granular Films

采用磁控溅射工艺制备了磁损耗型FeCoB-SiO2磁性纳米颗粒膜。利用X射线衍射仪、扫描探针显微镜、透射电子显微镜观测样品的微结构和形貌特征,采用振动样品磁强计、四探针法、微波矢量分析仪及微带短路扫频测量方法测量薄膜试样的磁电性能和微波磁导率。重点分析了SiO2电介质含量、薄膜微结构对样品电磁性能的影响。结果表明,所制备的FeCoB-SiO2纳米颗粒膜具有良好的软磁性能和高频电磁性能,2GHz时复磁导率实部和虚部均高于80,可以应用于抗电磁干扰和微波吸收材料。

FeCoB-SiO2 nano-granular films with high magnetic loss were synthesized by RF magnetron sputtering. Microstructures and morphology were analyzed by XRD, SPM and TEM. The magnetic parameters were measured by VSM. The electrical resistivity was measured by dc four-probe method and the complex permeability spectra were measured by vector network analyzer. Effects of SiO2 volume fraction on the microstructure and electromagnetic properties were investigated and the mechanism was also discussed. Results show that these films have excellent performance in high frequency. Both real and imaginary part of complex permeability are larger than 80 at 2 GHz. Thus, the films may be applied as microwave absorbers in GHz range.