摘要
在新型薄膜材料的制备中,利用高能量密度的激光束、离子束等作为热源,辅助和诱导气相反应制备薄膜材料,克服了普通化学气相沉积和物理气相沉积超硬薄膜材料性能上的不足,显著地提高了薄膜的沉积效果。
In the production of new type of thin film materials, it uses the laser as well as plasma of high energy and density to act as the heat source, assists and induces gas phase reaction to produce thin film materials. It overcomes the properties shortcomings of vapor deposition in ordinary CVD and PVD. Remarkably improving the deposition effects of thin films also.
出处
《热处理技术与装备》
2006年第4期6-9,共4页
Heat Treatment Technology and Equipment
基金
江苏省教育厅自然科学研究指导性项目(04KJD430011)
关键词
高能束
气相沉积
薄膜
high energy beam
vapor deposition
thin films
