窄带Mo/Si多层膜反射镜

Narrowband Mo/Si multilayers mirrors

设计并制备了窄带M o/S i多层膜反射镜。利用高反射级次和减小M o层厚度两种方法减小M o/S i多层膜反射镜光谱宽度。对M o层厚度分别为2 nm和3 nm的M o/S i多层膜,设计了反射级次分别从1到6的多层膜系。制备方法采用直流磁控溅射技术,在国家同步辐射光谱与计量站上测试。结果表明,带宽随着反射级次增加而减少,在同一反射级次,M o层厚度为2 nm的多层膜反射光谱带宽较小。

The Mo/Si narrowband multilayer mirrors were designed for normal incidence angle of 5° at the wavelength of 14 nm using the combination of decreasing the thickness of Mo layer and utilizing high reflectivity orders. Using a direct current magnetron sputtering, these Mo/Si multilayer mirrors working in the 1^st, 2^nd, 3^rd, 4^th and 5^th orders for the thickness of Mo layer of 2 nm and 3 nm have been fabricated, and then measured on national synchrotron radiation facility in Hefei, China. The spectral widths both decrease with the increase of the reflectivity order. At the same reflectivity order, the spectral width is less for the thickness of Mo layer of tMo=2 nm than that for tMo=3 nm.