期刊文献+

节水技术在半导体制造企业的应用 被引量:7

Application of Water Saving Technology in Semiconductor Factory
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摘要 介绍了集成电路制造中的用水,讨论了节水在该行业中的重要性。详细分析了用水的特征和可能实现的节水手段和方法,特别阐述了如何对生产过程中使用的超纯水进行节流回收和再利用有价值的废水,为实现环保节能的集成电路制造企业提供了现实可行的操作依据。 Water as one of necessary utilities used in semiconductor factory was introduced, it focused on the essentiality of water-saving in this field, and how to reduce water in the factory with feasible and economical methods were respectively described, especially emphasized on water reclaim in process and waste water reusing. It will be a helpful mean to the semiconductor factories that wish to be environment-friendly company.
出处 《半导体技术》 CAS CSCD 北大核心 2006年第9期653-655,共3页 Semiconductor Technology
关键词 集成电路制造 超纯水 回收率 酸洗机 化学机械抛光 IC manufactory UPW water reclaim rate wet bench CMP
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参考文献3

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二级参考文献4

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同被引文献27

  • 1刘新超,高连敬,孙勇.半导体集成电路器件生产废水处理工艺研究与应用[J].能源环境保护,2005,19(4):39-41. 被引量:3
  • 2莫春兰,方文卿,王立,刘和初,周毛兴,江风益.硅衬底GaN基LED的研究进展[J].液晶与显示,2005,20(5):422-429. 被引量:5
  • 3王晓云,付爱民,李景.台湾某半导体企业的废水处理工程实例[J].中国给水排水,2006,22(20):73-76. 被引量:6
  • 4车俊铁,黄俊华.不锈钢管道焊缝区域的海水腐蚀性能[J].材料开发与应用,2007,22(1):44-47. 被引量:7
  • 5Wang B J, Lee L L, Chen C H, et al. Optimization of semiconductor processing water management strategy [J]. Journal of Environmental Informatics, 2005,5 (2), 82-89.
  • 6Cynthia F Murphy, Georgea K Enig, David T Allen, et al. Development of parametric material, energy and emission inventories for wafer fabrication in the semiconductor industry [J]. Environmental Science Technology,2003, 37,5373-5382.
  • 7卢文章.浅谈半导体产业工节约用水.节水季刊,1998,11:13-20.
  • 8Hidetoshi Wakamatsu, Yoshihiro Kikka, Norio Tanaka. In- troduction of ultra pure water close system into semicon- ductor plant[J]. Oki Technical Review, 1998, 63(160) :45-48.
  • 9Chris Thompson P E, Edward Lickteig. Recycling high-pu- rity rinse water at SAMSUNG Austin Semiconductor [J]. Ultrapure Water, 2005, UP220735: 35-40.
  • 10黄俞昌.科学园节约用水之努力与做法.节水季刊,2005,37:15-21.

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二级引证文献8

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