偏离最佳条件的基于模型的光学邻近效应修正

Off-Target Model-Based OPC

提出了一种新型的与制程窗口紧密相关,被称为偏离最佳条件的基于模型的光学邻近效应模型,该模型包含制程参数变化的信息。该模型引导得到的修正的图形在工艺参数变化时也会表现得非常稳定,而且相对标准模型而言,缩短了建立模型的周期,节省了光罩出版的时间。

A newly model-based OPC （MBOPC） is provided, off-target MBOPC, which has close relationship with process window and the model is sensitive with process parameters variations. The OPC modifications guided by the model are robust within the process window. At the same time the model reduced the cycle-time of model-built and save the time of mask tape-out.